EDN

VLSI confab melds explorations of semi process, design issues

MANHASSET, N.Y. — The interdependence between process and design is in full evidence at this year's VLSI Symposia, being held June 17-20 in Honolulu, Hawaii. The Symposium on VLSI Technology straddles ...
Business Insider

Global Metrology, Inspection, and Process Control in VLSI Manufacturing Markets 2020: Lithography Metrology; Wafer Inspection/Defect Review; Thin Film Metrology

Dublin, Oct. 16, 2020 (GLOBE NEWSWIRE) -- The "Metrology, Inspection, and Process Control in VLSI Manufacturing" report from The Information Network has been added to ResearchAndMarkets.com's offering ...
EDN

VLSI: Intel’s 32-nm process ready for RF

SAN JOSE, Calif. — At this week's 2010 Symposium on VLSI Circuits in Hawaii, Intel Corp. has put a new twist on its previously-announced 32-nm process: It claims the technology is suitable for ...
Nature

Intellectual Property Protection in VLSI Design and Security

The protection of intellectual property in very-large-scale integration (VLSI) design is increasingly critical in an era where the global semiconductor supply chain is highly interconnected and ...